Nikon NSR-SF100 Wafer Stepper
Nikon NSR-SF100 Wafer Stepper
Nikon NSR-SF100 Wafer Stepper
Nikon NSR-SF100 Wafer Stepper

Nikon NSR-SF100 Wafer Stepper

This piece of used equipment is surplus and is immediately available for purchase.
  • Submit An Enquiry or email us at team@evensale.com
    • Make: 
    Nikon
    Model: 
    NSR-SF100
    Vintage: 
    2001
    Quantity: 
    5
    Configuration and Description: 

     

    Lithography Equipment System
    Configured for 200 mm wafers
    NIKON NSR-SF100 I Line Scan Field Stepper 
    Chamber make : Sendai Nikon 
    Wafer size : 200 mm 
    wafer type : Notch 
    Reticle size : 6 x 6 
    Pelicle type : NIKON
    Pelicle size : 122 x 149 
    Field size : 25 mm x 33 mm 
    Reticle Alignment scope : 25-26mm movable 
    Wafer carrier stage : 1 
    Local FOUP/SMIF stage : FOUP 
    Wafer loader type : Type 3 
    Pre-Alignment : Non-Contact 
    Wafer holder : Ceramic 
    Reticle case type : Nikon cassette 
    Reticle library : 1 
    Reticle Library capacity : 10 
    Reticle particle checker : None 
    Reticle Bar-code Reader : Yes 
    Reticle Case Bar-code Reader : None 
    Custom aperture : Small 
    Focus check Function : TTL-FC2 
    Alignment function : FIA/LSA 
    Inline Direction : Left 
    Inline C/D : ACT-8 
    Altitude : 270 meters 
    Chamber temp : 23 Degrees 
    MCSV Version : 4.23D 
    OCSV Version : 4.21 
    Tool Version : M103C 
    Basekit Version BASE : BASE9M101-0204A  WL : WLDRX3062-V340A
    RL : RLDR8_011-V430A 
    Unit Soft Version : ST : 9MV2.90  AL : 83V1.60  PA : 82V6.30  LC : A1V4.10 WR : 62V3.40  WL : 22V3.40  
    OF : 22V4.30  WLT : WLT31V2.50 RL : 11V4.40  RR : W07V4.2 
    Online software OCS-SECS
    Can be Inspected 
    Crated and stored