Chemical Vapor Deposition (CVD)

MVS PECVD machine

MVS PECVD machine

Make: 
MVS
Model: 
PECVD machine
Configuration and Description: 

MVSystem PECVD machine It can be used for deposition of Hydrogenated amorphous Silicon and Silicon compounds (SiNx, SiCx, SiOx) based thin films.

NOVELLUS CONCEPT 2

Make: 
Model: 
CONCEPT 2
Vintage: 
Configuration and Description: 

W DEP

AMAT 5200 ULTIMA

Make: 
Model: 
5200 ULTIMA
Vintage: 
Configuration and Description: 

HDP STI/ILD

AMAT 5200 CENTURA

Make: 
Model: 
5200 CENTURA
Vintage: 
Configuration and Description: 

RTP GATE-TOXIC

AMAT 5500

Make: 
Applied Materials
Model: 
5500
Configuration and Description: 

ADHESION CVD 1BC

TEL Trias

Make: 
TEL
Model: 
Trias
Vintage: 
Configuration and Description: 
Novellus Concept Two-Dual Speed

Novellus Concept Two-Dual Speed

Make: 
Novellus Systems Inc.
Model: 
Concept Two-Dual Speed
Vintage: 
1999
Configuration and Description: 

 

Novellus Systems Inc. Concept Two-Triple Speed

Make: 
Novellus Systems Inc.
Model: 
Concept Two-Triple Speed
Vintage: 
Configuration and Description: 

HDP CVD (Chemical Vapor Deposition)

Novellus Systems Inc. Concept Two-Triple Speed xT-S

Make: 
Novellus Systems Inc.
Model: 
Concept Two-Triple Speed xT-S
Vintage: 
Configuration and Description: 

HDP CVD (Chemical Vapor Deposition)

PSK ULTIMA III

PSK ULTIMA III

Make: 
P.S.K. Tech Inc.
Model: 
ULTIMA III
Vintage: 
1998
Configuration and Description: 

 

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