Applied Materials Centura ACP RP EPI
Applied Materials Centura ACP RP EPI
Applied Materials Centura ACP RP EPI
Applied Materials Centura ACP RP EPI

Applied Materials Centura ACP RP EPI

This piece of used equipment is surplus and is immediately available for purchase.
  • Submit An Enquiry or email us at team@evensale.com
    • Make: 
    Applied Materials
    Model: 
    Centura ACP RP EPI
    Vintage: 
    2006
    Quantity: 
    1
    Category: 
    Sputtering and Deposition Equipment
    Configuration and Description: 

     

    Epitaxial Silicon (EPI)

     

    Configured for 300mm wafers
    Centura ACP mainframe
    2x FOUP

     

    Factory Interface (5.X)
    • Yaskawa robot
    • Wafer mapping
    • Orient
    • Ionizer

     

    CH B – EPI 300
    • Reduced Pressure (RP)
    • Gasses (Unit 8560 MFCs)

     

    CH D – EPI 300
    • Reduced Pressure (RP)
    • Gasses (Unit 8560 MFCs)